Resist and stochastics researcher

Within ASML, the Research department supports the long-term roadmap by exploring novel concepts and developing new competences relevant to semiconductor manufacturing. The mission of the Resist and Stochastics Researcher is to conduct research supporting ASML's computational metrology and patterning products, with focus on future applications in the semiconductor industry. This involves preparation of exposure designs of experiments, analyzing wafer data after exposure, developing resist and process models, performing literature studies, and creating innovative concepts and solutions. A key aspect of the job is to experimentally test lithography performance in terms of stochastics, and to develop a quantitative description of how lithography exposure conditions & resist material properties influence stochastic pattern variability such as line width roughness and stochastic defects such as microbridges. This includes a rigorous description of the exposure process, photoionization, photochemical reactions, photoresist development, and typical wafer metrology techniques such as CD-SEM, AFM & XS-TEM.